X-ray absorption fine structure and electron energy loss spectroscopy study of silicon nanowires at the Si L-3,L-2 edge
| dc.contributor.author | Sun, XH | en_US |
| dc.contributor.author | Tang, YH | en_US |
| dc.contributor.author | Zhang, P. | en_US |
| dc.contributor.author | Naftel, SJ | en_US |
| dc.contributor.author | Sammynaiken, R. | en_US |
| dc.contributor.author | Sham, TK | en_US |
| dc.contributor.author | Peng, HY | en_US |
| dc.contributor.author | Zhang, YF | en_US |
| dc.contributor.author | Wong, NB | en_US |
| dc.contributor.author | Lee, ST | en_US |
| dc.date.accessioned | 2013-08-12T16:55:58Z | |
| dc.date.available | 2013-08-12T16:55:58Z | |
| dc.date.issued | 2001-12 | en_US |
| dc.description.abstract | No abstract available. | en_US |
| dc.identifier.citation | Reproduced from Sun, XH, YH Tang, P. Zhang, SJ Naftel, et al. 2001. "X-ray absorption fine structure and electron energy loss spectroscopy study of silicon nanowires at the Si L-3,L-2 edge." Journal of Applied Physics 90(12): 6379-6383, with the permission of AIP Publishing. | en_US |
| dc.identifier.issn | 0021-8979 | en_US |
| dc.identifier.issue | 12 | en_US |
| dc.identifier.startpage | 6379 | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1063/1.1417997 | en_US |
| dc.identifier.uri | http://hdl.handle.net/10222/30977 | |
| dc.identifier.volume | 90 | en_US |
| dc.relation.ispartof | Journal of Applied Physics | en_US |
| dc.title | X-ray absorption fine structure and electron energy loss spectroscopy study of silicon nanowires at the Si L-3,L-2 edge | en_US |
| dc.type | article | en_US |
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